Pure Appl. Chem., 1973, Vol. 33, No. 2-3, pp. 217-246
http://dx.doi.org/10.1351/pac197333020217
Direct and sensitized photolysis of dimethyl sulphoxide in solution*
First page:
*Fourth IUPAC International Photochemistry Symposium, 16-22 July, Baden-Baden, Germany