Author detail
Articles by F. J. de Hoog
- Treatment of dust particles in an RF plasma monitored by Mie scattering rotating compensator ellipsometry
- On the plasmaphysics of plasma-etching
Coauthors
- G. H. P. M. Swinkels (1 article)
- N. Simons (1 article)
- T. J. Bisschops (1 article)
- W. W. Stoffels (1 article)
- E. Stoffels (1 article)
- G. M. W. Kroesen (1 article)