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Articles by E. Stoffels

  • G. H. P. M. Swinkels, E. Stoffels, W. W. Stoffels, N. Simons, G. M. W. Kroesen and F. J. de Hoog
    Treatment of dust particles in an RF plasma monitored by Mie scattering rotating compensator ellipsometry
  • A. Bouchoule, L. Boufendi, J. Hermann, A. Plain, T. Hbid, G. Kroesen, E. Stoffels and W. W. Stoffels
    Formation of dense submicronic clouds in low pressure Ar-SiH4 RF reactor: Diagnostics and growth processes from monomers to large size particulates