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Pure Appl. Chem., 2002, Vol. 74, No. 3, pp. 359-367

Plasma production of nanocrystalline silicon particles and polymorphous silicon thin films for large-area electronic devices

Pere Roca i Cabarrocas, Anna Fontcuberta i Morral, Sarra Lebib and Yves Poissant

Laboratoire de Physique des Interfaces et des Couches Minces (UMR 7647 ­ CNRS) Ecole Polytechnique, 91128 Palaiseau Cedex, France

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  • Franta Daniel, Ohlı́dal Ivan, Klapetek Petr, Roca i Cabarrocas Pere: Complete characterization of rough polymorphous silicon films by atomic force microscopy and the combined method of spectroscopic ellipsometry and spectroscopic reflectometry. This Solid Films 2004, 455-456, 399. <>
  • Lebib S., P. Roca i Cabarrocas: Structure and hydrogen bonding in plasma deposited polymorphous silicon thin films. Eur Phys J AP 2004, 26, 17. <>
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  • Fontcuberta i Morral A., Roca i Cabarrocas P., Clerc C.: Structure and hydrogen content of polymorphous silicon thin films studied by spectroscopic ellipsometry and nuclear measurements. Phys Rev B 2004, 69, 125307. <>
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  • Poissant Y., Chatterjee P., Roca i Cabarrocas P.: Analysis and optimization of the performance of polymorphous silicon solar cells: Experimental characterization and computer modeling. J Appl Phys 2003, 94, 7305. <>
  • Bhandarkar Upendra, Kortshagen Uwe, Girshick Steven L: Numerical study of the effect of gas temperature on the time for onset of particle nucleation in argon–silane low-pressure plasmas. J Phys D Appl Phys 2003, 36, 1399. <>
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  • Gueunier M. E., Kleider J. P., Brüggemann R., Lebib S., Roca i Cabarrocas P., Meaudre R., Canut B.: Properties of polymorphous silicon–germanium alloys deposited under high hydrogen dilution and at high pressure. J Appl Phys 2002, 92, 4959. <>