CrossRef enabled

PAC Archives

Archive →

Pure Appl. Chem., 1998, Vol. 70, No. 6, pp. 1203-1208

http://dx.doi.org/10.1351/pac199870061203

Process control of organosilicon plasmas for barrier film preparations

R. Lamendola and R. d’Agostino

CrossRef Cited-by theme picture

CrossRef Cited-by Linking

  • Santos Nazir M., Amorim Jayr, Nascente Pedro A.P., Freire Célia M.A., Cruz Nilson C., Rangel Elidiane C.: Enhancement of Corrosion Resistance AISI 304 Steel by Plasma Polymerized Thin Films. MRS Proc. 2013, 1499. <http://dx.doi.org/10.1557/opl.2013.442>
  • Siarkowski Acácio Luiz, Hernandez Leonardo Frois, Borges Ben-Hur Viana, Morimoto Nilton Itiro: Sensing based on Mach-Zehnder interferometer and hydrophobic thin films used on volatile organic compounds detection. Opt. Eng. 2012, 51, 054401. <http://dx.doi.org/10.1117/1.OE.51.5.054401>
  • Palaskar Shital, Kale Kiran H., Nadiger G. S., Desai A. N.: Dielectric barrier discharge plasma induced surface modification of polyester/cotton blended fabrics to impart water repellency using HMDSO. J App Pol Sci 2011, 122, 1092. <http://dx.doi.org/10.1002/app.34237>
  • Plog Simone, Schneider Joachim, Walker Matthias, Schulz Andreas, Stroth Ulrich: Investigations of plasma polymerized SiOx barrier films for polymer food packaging. Surface and Coatings Technology 2011, 205, S165. <http://dx.doi.org/10.1016/j.surfcoat.2011.01.034>
  • Jiang Juan, Benter Maike, Taboryski Rafael, Bechgaard Klaus: Oxygen barrier coating deposited by novel plasma-enhanced chemical vapor deposition. J Appl Polym Sci 2010, 115, 2767. <http://dx.doi.org/10.1002/app.30222>
  • Aresta Gianfranco, Premkumar Peter Antony, Starostin Sergey A., de Vries Hindrik, van de Sanden Mauritius C. M., Creatore Mariadriana: Optical Characterization of Plasma-Deposited SiO2-Like Layers on Anisotropic Polymeric Substrates. Plasma Process Polym 2010, 7, 766. <http://dx.doi.org/10.1002/ppap.200900109>
  • Coclite Anna Maria, Ozaydin-Ince Gozde, Palumbo Fabio, Milella Antonella, Gleason Karen K.: Single-Chamber Deposition of Multilayer Barriers by Plasma Enhanced and Initiated Chemical Vapor Deposition of Organosilicones. Plasma Process Polym 2010, 7, 561. <http://dx.doi.org/10.1002/ppap.200900139>
  • Coclite Anna Maria, Milella Antonella, Palumbo Fabio, Le Pen Christophe, d'Agostino Riccardo: Plasma Deposited Organosilicon Multistacks for High-Performance Low-Carbon Steel Protection. Plasma Process Polym 2010, 7, 802. <http://dx.doi.org/10.1002/ppap.201000017>
  • Coclite Anna Maria, Milella Antonella, d'Agostino Riccardo, Palumbo Fabio: On the relationship between the structure and the barrier performance of plasma deposited silicon dioxide-like films. Surface Coatings and Technology 2010, 204, 4012. <http://dx.doi.org/10.1016/j.surfcoat.2010.05.024>
  • Körner L., Sonnenfeld A., von Rohr Ph. Rudolf: Silicon oxide diffusion barrier coatings on polypropylene. This Solid Films 2010, 518, 4840. <http://dx.doi.org/10.1016/j.tsf.2010.02.006>
  • Körner L, Sonnenfeld A, Heuberger R, Waller J H, Leterrier Y, Månson J A E, Rudolf von Rohr Ph: Oxygen permeation, mechanical and structural properties of multilayer diffusion barrier coatings on polypropylene. J Phys D Appl Phys 2010, 43, 115301. <http://dx.doi.org/10.1088/0022-3727/43/11/115301>
  • Schneider Joachim, Akbar Muhammad Iqbal, Dutroncy Jerôme, Kiesler Dennis, Leins Martina, Schulz Andreas, Walker Matthias, Schumacher Uwe, Stroth Ulrich: Silicon Oxide Barrier Coatings Deposited on Polymer Materials for Applications in Food Packaging Industry. Plasma Processes Polym. 2009, 6, S700. <http://dx.doi.org/10.1002/ppap.200931702>
  • Francescangeli Adriano, Palumbo Fabio, d'Agostino Riccardo: Deposition of Barrier Coatings from Vinyltrimethylsilane-Fed Glow Discharges. Plasma Process Polym 2008, 5, 708. <http://dx.doi.org/10.1002/ppap.200800041>
  • Deilmann Michael, Theiß Sebastian, Awakowicz Peter: Pulsed microwave plasma polymerization of silicon oxide films: Application of efficient permeation barriers on polyethylene terephthalate. Surface Coatings and Technology 2008, 202, 1911. <http://dx.doi.org/10.1016/j.surfcoat.2007.08.034>
  • Saloum S, Naddaf M, Alkhaled B: Diagnostics of N2–Ar plasma mixture excited in a 13.56 MHz hollow cathode discharge system: application to remote plasma treatment of polyamide surface. J Phys D Appl Phys 2008, 41, 045205. <http://dx.doi.org/10.1088/0022-3727/41/4/045205>
  • Assis Odilio B. G., Hotchkiss Joseph H.: Surface hydrophobic modification of chitosan thin films by hexamethyldisilazane plasma deposition: effects on water vapour, CO2 and O2 permeabilities. Packag Technol Sci 2007, 20, 293. <http://dx.doi.org/10.1002/pts.766>
  • Naddaf M, Saloum S, Hamadeh H: Photoluminescence from PP-HMDSO thin films deposited using a remote plasma of 13.56 MHz hollow cathode discharge. J Phys D Appl Phys 2007, 40, 4015. <http://dx.doi.org/10.1088/0022-3727/40/13/016>
  • Tran N.D., Dutta N.K., Roy Choudhury N.: Weatherability and wear resistance characteristics of plasma fluoropolymer coatings deposited on an elastomer substrate. Polym Deg Stabil 2006, 91, 1052. <http://dx.doi.org/10.1016/j.polymdegradstab.2005.07.008>
  • Grüniger A., Bieder A., Sonnenfeld A., von Rohr Ph. Rudolf, Müller U., Hauert R.: Influence of film structure and composition on diffusion barrier performance of SiOx thin films deposited by PECVD. Surface Coatings and Technology 2006, 200, 4564. <http://dx.doi.org/10.1016/j.surfcoat.2005.03.044>
  • Creatore M, Barrell Y, Benedikt J, Sanden M C M van de: On the hexamethyldisiloxane dissociation paths in a remote Ar-fed expanding thermal plasma. Plasma Sources Sci Technol 2006, 15, 421. <http://dx.doi.org/10.1088/0963-0252/15/3/018>
  • Tran Nguyen D, Choudhury Namita R, Dutta Naba K: Surface tailoring of an ethylene propylene diene elastomeric terpolymer via plasma-polymerized coating of tetramethyldisiloxane. Polym Int 2005, 54, 513. <http://dx.doi.org/10.1002/pi.1694>
  • Tran N.D., Dutta N.K., Choudhury N. Roy: Plasma-polymerized perfluoro(methylcyclohexane) coating on ethylene propylene diene elastomer surface: Effect of plasma processing condition on the deposition kinetics, morphology and surface energy of the film. This Solid Films 2005, 491, 123. <http://dx.doi.org/10.1016/j.tsf.2005.05.046>
  • Grüniger A., Rudolf von Rohr P.: Deposition of SiO2-like diffusion barriers on PET and paper by PECVD. Surface Coatings and Technology 2003, 174-175, 1043. <http://dx.doi.org/10.1016/S0257-8972(03)00327-X>
  • da Silva M.L.P., Tan I.H., Nascimento Filho A.P., Galeazzo E., Jesus D.P.: Use of plasma polymerized highly hydrophobic hexamethyldissilazane (HMDS) films for sensor development. Actuat B 2003, 91, 362. <http://dx.doi.org/10.1016/S0925-4005(03)00112-6>