Pure and Applied Chemistry, 1998, Volume 70, No. 6, pp. 1187-1191, Cited by

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Pure Appl. Chem., 1998, Vol. 70, No. 6, pp. 1187-1191

http://dx.doi.org/10.1351/pac199870061187

Phasespace modelling of a radiofrequency plasma interacting with surfaces

Toshiaki Makabe, Jun Matsui and N. Nakano

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Maeshige Kazunobu, Washio Gentaro, Yagisawa Takashi, Makabe Toshiaki: Functional design of a pulsed two-frequency capacitively coupled plasma in CF[sub 4]/Ar for SiO[sub 2] etching. J Appl Phys 2002, 91, 9494. <http://dx.doi.org/10.1063/1.1478138>