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Pure Appl. Chem., 1994, Vol. 66, No. 6, pp. 1185-1193

http://dx.doi.org/10.1351/pac199466061185

The chemistry of etching and deposition processes

R. d’Agostino, F. Fracassi and R. Lamendola

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  • Gavrilov G.E., Aksenov D.A., Conti R., Fetisov A.A., Krivchitch A.G., Maysuzenko D.A., Shvecova N.Yu., Vakhtel V.M.: Using an 80% CF4+20% CO2 gas mixture to recover aged anode wires in proportional chambers. Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment 2012, 694, 167. <http://dx.doi.org/10.1016/j.nima.2012.08.015>
  • D'AGOSTINO R., FRACASSI F., LAMENDOLA R.: ChemInform Abstract: The Chemistry of Etching and Deposition Processes. ChemInform 2010, 25, no. <http://dx.doi.org/10.1002/chin.199452311>
  • Pereira M.R., Fonseca J.L.C.: The kinetics of growth of plasma polymer films. Euro Poly J 1999, 35, 41. <http://dx.doi.org/10.1016/S0014-3057(98)00096-2>