CrossRef enabled

PAC Archives

Archive →

Pure Appl. Chem., 1990, Vol. 62, No. 9, pp. 1681-1688

http://dx.doi.org/10.1351/pac199062091681

Deposition of amorphous silicon alloys

J. Perrin

CrossRef Cited-by theme picture

CrossRef Cited-by Linking

  • Wang Qiang, Göhlich Andreas, Ruß Marco, Yang Pin, Vogt Holger: PECVD of poly-SiGe/Ge layers with increased total gas flow. Microelectronic Engineering 2014, 115, 26. <http://dx.doi.org/10.1016/j.mee.2013.10.027>
  • Hoshino M., Matejčík Š., Nunes Y., Ferreira da Silva F., Limão-Vieira P., Tanaka H.: Negative ion formation through dissociative electron attachment to GeH4: Comparative studies with CH4 and SiH4. Int J Mass Spectrosc 2011, 306, 51. <http://dx.doi.org/10.1016/j.ijms.2011.06.009>
  • Gordiets B. F., Andújar J. L., Corbella C., Bertran E.: Kinetic model of thin film growth by vapor deposition. Eur Phys J D 2005, 35, 505. <http://dx.doi.org/10.1140/epjd/e2005-00084-x>
  • Schram D C, Mullen J A M van der, Sanden M C M van de: Plasma Phys Control Fusion 1994, 36, B65. <http://dx.doi.org/10.1088/0741-3335/36/12B/005>
  • Conde J. P., Chan K. K., Blum J. M., Arienzo M., Monteiro P. A., Ferreira J. A., Chu V., Wyrsh N.: Annealing kinetics of a-Si:H deposited by concentric-electrode rf glow discharge at room temperature. J Appl Phys 1993, 73, 1826. <http://dx.doi.org/10.1063/1.353167>
  • Conde J. P., Chan K. K., Blum J. M., Arienzo M., Cuomo J. J.: Deposition of amorphous silicon using a tubular reactor with concentric-electrode confinement. J Appl Phys 1992, 71, 3981. <http://dx.doi.org/10.1063/1.350870>
  • Conde J. P., Chan K. K., Blum J. M., Arienzo M.: The effect of the flow of silane on the properties of a-Si:H deposited by concentric-electrode radio frequency glow-discharge. J Appl Phys 1992, 71, 3990. <http://dx.doi.org/10.1063/1.350871>
  • Andújar J. L., Bertran E., Canillas A., Campmany J., Morenza J. L.: Effect of substrate temperature on deposition rate of rf plasma-deposited hydrogenated amorphous silicon thin films. J Appl Phys 1991, 69, 3757. <http://dx.doi.org/10.1063/1.348470>
  • Schmttt J. P. M.: Problems in Large Size Amorphous Silicon Plate Manufacturing. Mat Res Symp Proc 1991, 219, 631. <http://dx.doi.org/10.1557/PROC-219-631>
  • Klemberg-Sapieha J.E, Küttel O.M, Martinu L, Wertheimer M.R: Dual microwave-r.f. plasma deposition of functional coatings. This Solid Films 1990, 193-194, 965. <http://dx.doi.org/10.1016/0040-6090(90)90251-8>