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Pure Appl. Chem., 1990, Vol. 62, No. 1, pp. 89-101

http://dx.doi.org/10.1351/pac199062010089

Role of high temperature chemistry in CVD (chemical vapor deposition) processing

K. E. Spear and R. R. Kirkx

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  • Dekker J. P., Moene R., Schoonman J.: The influence of surface kinetics in modelling chemical vapour deposition processes in porous preforms. J Materials Sci 1996, 31, 3021. <http://dx.doi.org/10.1007/BF00356018>
  • Dekker J.P., van der Put P.J., Veringa H.J., Schoonman J.: Chemical vapour infiltration of TiB2 and TiN in porous Al2O3. J Eur Ceram 1994, 14, 245. <http://dx.doi.org/10.1016/0955-2219(94)90093-0>
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