Pure Appl. Chem., 1988, Vol. 60, No. 5, pp. 769-780
http://dx.doi.org/10.1351/pac198860050769
Diagnostics and control of low pressure plasmas for the chemical vapor deposition (CVD) of amorphous semiconductor and insulator films
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Other PAC articles by these authors
Analysis of Coulomb-crystal formation process for application to tailored particle synthesis in RF plasmas