Pure and Applied Chemistry, 1988, Volume 60, No. 5, pp. 769-780, Cited by

Pure Appl. Chem., 1988, Vol. 60, No. 5, pp. 769-780

http://dx.doi.org/10.1351/pac198860050769

Diagnostics and control of low pressure plasmas for the chemical vapor deposition (CVD) of amorphous semiconductor and insulator films

K. Tachibana

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