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Pure Appl. Chem., 1985, Vol. 57, No. 9, pp. 1287-1298

http://dx.doi.org/10.1351/pac198557091287

Mechanism of etching, polymerization and deposition in R.F. (radio frequency) discharges

R. d’Agostino, P. Capezzuto, G. Bruno and F. Cramarossa

Individual author index pages

Other PAC articles by these authors

A. Milella, F. Palumbo, P. Favia, G. Cicala and R. d’Agostino
Deposition mechanism of nanostructured thin films from tetrafluoroethylene glow discharges
2005, Vol. 77, Issue 2, pp. 399-414 [Details + Abstract] [Full text - pdf 968 kB]
R. Lamendola and R. d’Agostino
Process control of organosilicon plasmas for barrier film preparations
1998, Vol. 70, Issue 6, pp. 1203-1208 [Details] [Full text - pdf 478 kB]
M. Losurdo, P. Capezzuto and G. Bruno
Plasmasurface interactions in the processing of iiiv semiconductor materials
1998, Vol. 70, Issue 6, pp. 1181-1186 [Details] [Full text - pdf 553 kB]
G. Cicala, G. Bruno and P. Capezzuto
Plasma deposition of amorphous silicon alloys from fluorinated gases
1996, Vol. 68, Issue 5, pp. 1143-1149 [Details] [Full text - pdf 619 kB]
P. Favia, R. d’Agostino and F. Fracassi
Plasma and surface diagnostics in PECVD (plasma-enhanced chemical vapor deposition) from silicon containing organic monomers
1994, Vol. 66, Issue 6, pp. 1373-1380 [Details] [Full text - pdf 534 kB]
R. d’Agostino, F. Fracassi and R. Lamendola
The chemistry of etching and deposition processes
1994, Vol. 66, Issue 6, pp. 1185-1193 [Details] [Full text - pdf 591 kB]
G. Bruno, P. Capezzuto and G. Cicala
Novel approaches to plasma deposition of amorphous silicon-based materials
1992, Vol. 64, Issue 5, pp. 725-730 [Details] [Full text - pdf 537 kB]
F. Fracassi and R. d’Agostino
Chemistry of titanium dry etching in fluorinated and chlorinated gases
1992, Vol. 64, Issue 5, pp. 703-707 [Details] [Full text - pdf 400 kB]
P. Capezzuto and G. Bruno
Plasma deposition of amorphous silicon films: an overview on some open questions
1988, Vol. 60, Issue 5, pp. 633-644 [Details] [Full text - pdf 783 kB]