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Pure Appl. Chem., 1985, Vol. 57, No. 9, pp. 1287-1298

http://dx.doi.org/10.1351/pac198557091287

Mechanism of etching, polymerization and deposition in R.F. (radio frequency) discharges

R. d’Agostino, P. Capezzuto, G. Bruno and F. Cramarossa

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