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Pure Appl. Chem., 1973, Vol. 33, No. 2-3, pp. 217-246

http://dx.doi.org/10.1351/pac197333020217

Direct and sensitized photolysis of dimethyl sulphoxide in solution*

K. Gollnick and H.-U. Stracke

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*Fourth IUPAC International Photochemistry Symposium, 16-22 July, Baden-Baden, Germany